Magnetron Sputtering and Thin-Film Deposition: Fundamentals, Processes, and Numerical Modeling

Informations bibliographiques

Date de publication

2026

Langue

Anglais

ISBN

978-9969-677-66-9

Pages

168

Domaine

Sciences et Technologies

Résumé

This book provides a comprehensive introduction to magnetron sputtering and thin-film deposition, combining fundamental science, process engineering, and numerical modeling. It explains thin-film growth, morphology, microstructure, and the physical principles of sputtering, then develops the plasma physics, sheath behavior, ion–solid interactions, and sputtering-yield mechanisms that govern material removal. The book also examines magnetron configurations, reactive sputtering, HiPIMS, process parameters, and practical control strategies for reproducible deposition. A dedicated modeling section presents Monte Carlo methods, PIC/MCC, fluid and hybrid plasma models, binary-collision approaches, molecular dynamics, SRIM/TRIM, and SIMTRA. By connecting target erosion, particle transport, substrate arrival, and film growth, the book offers students, researchers, and engineers a unified framework for understanding, simulating, and optimizing modern sputter-deposition processes in advanced materials applications.

Auteurs et contributions

Citation recommandée

REFAS Salah Eddine Chouaib (2026). Magnetron Sputtering and Thin-Film Deposition: Fundamentals, Processes, and Numerical Modeling. SARAHMED Éditions.